In situ intercalation of TaS2 in the electron microscope
In situ intercalation of TaS2 in the electron microscope
复制标题
电子显微镜下 TaS2 的原位插层
DOI：
10.1080/13642817808245322
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发表时间：
1978
期刊：
影响因子：
--
通讯作者：
J. Acrivos
中科院分区：
文献类型：
--
作者：
G. Tatlock;J. Acrivos
摘要利用电子衍射技术，在电子显微镜下原位研究了TaS_2的IT、2 H和4 Hb多型体在肼气（N_2H_4）插层过程中各种复杂超晶格的形成。结果是在15 K-360 K的温度范围内，并解释从周期性晶格畸变的散射与电荷密度波。在生长的晶体和含有其他加合物的TaS 2样品中也进行了类似的效果的比较。
Abstract Electron diffraction has been used to study the formation of a variety of complex superlattices in the IT, 2H and 4Hb polytypes of TaS2 during intercalation with hydrazine gas (N2H4), in situ in the electron microscope. Results are presented over the temperature range 15 K-360 K and are interpreted in terms of scattering from periodic lattice distortions linked to charge density waves. Comparisons are also made with similar effects in both the as-grown crystals and TaS2 samples containing other adducts.