Effect of vacuum annealing on the microstructure and tribological behavior of hydrogenated amorphous carbon films prepared by magnetron sputtering
Effect of vacuum annealing on the microstructure and tribological behavior of hydrogenated amorphous carbon films prepared by magnetron sputtering
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DOI：
10.1177/1350650112469897
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发表时间：
2013-01
期刊：
影响因子：
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通讯作者：
Yanxia Wu;Hongxuan Li;L. Ji;Liu Liu-Liu;Yinping Ye;Jianmin Chen;Hui-di Zhou
中科院分区：
文献类型：
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作者：
Yanxia Wu;Hongxuan Li;L. Ji;Liu Liu-Liu;Yinping Ye;Jianmin Chen;Hui-di Zhou
采用中频非平衡磁控溅射法，以氩气（Ar）和甲烷（CH 4）为源气体，在硅和钢基片上制备了氢化非晶碳（a-C：H）薄膜。研究了真空退火温度对a-C：H薄膜的微观结构、力学性能和摩擦学性能的影响。采用销-盘摩擦磨损试验机研究了薄膜在不同环境（真空、氮气和空气）下的摩擦磨损性能，探讨了薄膜在真空中的滑动寿命与摩擦磨损机理的关系。结果表明，真空低温退火（200 ℃）对a-C：H薄膜的显微结构和硬度影响不大，但在一定程度上降低了薄膜的内应力和表面粗糙度。这些薄膜在各种试验环境中都表现出优异的抗磨性能，显示出作为空间润滑剂的潜力。在300 ℃左右，薄膜开始释放氢，类石墨结构的含量增加。结果表明，在200 ℃以上退火的a-C：H薄膜在所有测试环境中具有增加的表面粗糙度以及降低的硬度、内应力和耐磨性。
Hydrogenated amorphous carbon films (a-C:H) were prepared on silicon and steel substrates by medium frequency unbalanced magnetron sputtering with argon (Ar) and methane (CH4) as the source gases. The effect of annealing temperature in vacuum on the microstructure as well as mechanical properties and tribological behavior of as-prepared a-C:H films were investigated. The friction and wear behaviors of the films in different environments (vacuum, N2, and air) were evaluated with a pin-on-disk tribometer; and their sliding lifetime in vacuum was discussed in relation to friction and wear mechanisms. Results show that annealing in vacuum at a low temperature of up to 200 ℃ causes little change in the microstructure and hardness of a-C:H films but reduces their internal stress and surface roughness to some extent. These annealed films exhibit excellent antiwear ability in all test environments and show promising potential as a kind of space lubricants. The film begins to release hydrogen and increases the content of graphite-like structure at about 300 ℃. As a result, a-C:H films annealed above 200 ℃ have increased surface roughness as well as reduced hardness, internal stress, and wear resistance in all test environments.