Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity
Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity
复制标题
通过结合弹性不均匀性的相场模拟验证 C11b-MoSi2/C40-NbSi2 双相硅化物中层状结构形成和 Cr 界面偏析的机制
DOI：
--
复制
发表时间：
2015
影响因子：
3.3
通讯作者：
T. Yamazaki，Y. Koizumi，A. Chiba，K. Hagihara，T. Nakano，K. Yuge，K. Kishida and H. Inui
中科院分区：
文献类型：
--
作者：
T. Yamazaki，Y. Koizumi，A. Chiba，K. Hagihara，T. Nakano，K. Yuge，K. Kishida and H. Inui
