Generation of Customizable Micro-wavy Pattern through Grayscale Direct Image Lithography.
Generation of Customizable Micro-wavy Pattern through Grayscale Direct Image Lithography.
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DOI：
10.1038/srep21621
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发表时间：
2016-02-23
影响因子：
4.6
通讯作者：
Liu Y
中科院分区：
文献类型：
--
作者：
He R;Wang S;Andrews G;Shi W;Liu Y
随着表面研究的工作量不断增加，由于现有技术存在几何限制以及制造工艺复杂，人们迫切需要一种更有效的制造图案化微结构的方法。本文提出了一种高效且经济的方法，即利用直接成像光刻技术生成可定制的微波纹图案。该方法利用灰度高斯分布效应来模拟聚合过程中固有的不准确性，这些不准确性通常被视为琐事或误差。测量的表面轮廓与数学预测结果吻合良好，证明了该方法能够生成具有精确控制特征的波纹图案。通过可定制的参数（波长、振幅、波形、图案轮廓和整体尺寸）可以生成精确的图案。这种无掩模光刻方法提供了一种快速制造方法，能够生成波长从12μm到2100μm且振幅与波长之比高达300%的复杂且不均匀的3D波纹图案。作为一个示范应用，制造了具有纯波纹和波纹 - 人字形图案且适用于捕获循环肿瘤细胞的微流控装置。在无需使用洁净室或商业光刻设备的情况下，可以在几个小时内创建一个具有波纹图案的完全定制的微流控装置。
With the increasing amount of research work in surface studies, a more effective method of producing patterned microstructures is highly desired due to the geometric limitations and complex fabricating process of current techniques. This paper presents an efficient and cost-effective method to generate customizable micro-wavy pattern using direct image lithography. This method utilizes a grayscale Gaussian distribution effect to model inaccuracies inherent in the polymerization process, which are normally regarded as trivial matters or errors. The measured surface profiles and the mathematical prediction show a good agreement, demonstrating the ability of this method to generate wavy patterns with precisely controlled features. An accurate pattern can be generated with customizable parameters (wavelength, amplitude, wave shape, pattern profile, and overall dimension). This mask-free photolithography approach provides a rapid fabrication method that is capable of generating complex and non-uniform 3D wavy patterns with the wavelength ranging from 12 μm to 2100 μm and an amplitude-to-wavelength ratio as large as 300%. Microfluidic devices with pure wavy and wavy-herringbone patterns suitable for capture of circulating tumor cells are made as a demonstrative application. A completely customized microfluidic device with wavy patterns can be created within a few hours without access to clean room or commercial photolithography equipment.