Mechanism for orientation dependence of blisters on W surface exposed to D plasma at low temperature

Mechanism for orientation dependence of blisters on W surface exposed to D plasma at low temperature
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低温暴露于 D 等离子体的 W 表面气泡取向依赖性机制

DOI:
10.1016/j.jnucmat.2016.05.011
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发表时间:
2016-08
影响因子:
3.1
通讯作者:
De Temmerman G
De Temmerman G
中科院分区:
工程技术2区
文献类型:
--
作者:
Jia Y Z;Liu W;Xu B;Luo G N;Qu S L;Morgan T W;De Temmerman G

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利用扫描电子显微镜和电子背散射衍射研究了轧制钨和化学气相沉积(CVD)W样品在低温(约523 K)下D等离子体暴露诱导的气泡形成的取向依赖性。在表面法线方向接近[111]的晶粒上观察到严重的起泡,而[001]表面最耐起泡形成。在[111]、[110]和[001]表面下观察到D2气体诱导的空腔,与表面上是否观察到气泡无关。[111]表面更容易形成气泡,因为它很容易在D2气体压力下发生塑性变形。一些泡棱和台阶垂直于[110]方向,这可能是位错在{110}面上滑移所致。基于塑性变形机制的空泡模型可以很好地解释D等离子体诱导的空泡形貌。
The orientation dependence of blister formation induced by D plasma exposure at low temperature (about 523 K) on rolled tungsten and chemical vapor deposition (CVD) W samples was studied by scanning electron microscopy and electron backscatter diffraction. Severe blistering was observed on grains with surface normal directions close to [111], while the [001] surfaces are the most resistant to blister formation. Cavities induced by D2gas were observed beneath [111], [110] and [001] surfaces, independently on whether blisters were observed on the surface or not. The [111] surface is more prone to blister formation, because it is easily plastically deformed by the D2gas pressure. Some blister edges and steps were perpendicular to [110] directions, which may be induced by the slipping of dislocations on {110} planes. The blister morphology induced by D plasma can be well explained by the blister model based on plastic deformation mechanism.
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