Mechanism for orientation dependence of blisters on W surface exposed to D plasma at low temperature
Mechanism for orientation dependence of blisters on W surface exposed to D plasma at low temperature
复制标题
低温暴露于 D 等离子体的 W 表面气泡取向依赖性机制
DOI:
10.1016/j.jnucmat.2016.05.011
复制
发表时间:
2016-08
影响因子:
3.1
通讯作者:
De Temmerman G
中科院分区:
文献类型:
--
作者:
Jia Y Z;Liu W;Xu B;Luo G N;Qu S L;Morgan T W;De Temmerman G
The orientation dependence of blister formation induced by D plasma exposure at low temperature (about 523 K) on rolled tungsten and chemical vapor deposition (CVD) W samples was studied by scanning electron microscopy and electron backscatter diffraction. Severe blistering was observed on grains with surface normal directions close to [111], while the [001] surfaces are the most resistant to blister formation. Cavities induced by D2gas were observed beneath [111], [110] and [001] surfaces, independently on whether blisters were observed on the surface or not. The [111] surface is more prone to blister formation, because it is easily plastically deformed by the D2gas pressure. Some blister edges and steps were perpendicular to [110] directions, which may be induced by the slipping of dislocations on {110} planes. The blister morphology induced by D plasma can be well explained by the blister model based on plastic deformation mechanism.
登录
查看更多内容
影响因子:
--
作者:
L. Eriksson;J. Davies;P. Jespersgaard
通讯作者:
L. Eriksson;J. Davies;P. Jespersgaard
影响因子:
3.1
作者:
P. Gumbsch
通讯作者:
P. Gumbsch
影响因子:
2.9
作者:
S. Lindig;M. Balden;V. Alimov;T. Yamanishi;W. Shu;J. Roth
通讯作者:
S. Lindig;M. Balden;V. Alimov;T. Yamanishi;W. Shu;J. Roth
影响因子:
3.3
作者:
Shu, W. M.;Wakai, E.;Yamanishi, T.
通讯作者:
Yamanishi, T.
影响因子:
2.9
作者:
W. Wampler;R. Doerner
通讯作者:
W. Wampler;R. Doerner