Integrated nanoscale silicon sensors using top-down fabrication

Integrated nanoscale silicon sensors using top-down fabrication
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DOI:
10.1063/1.1630853
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发表时间:
2003-12-01
影响因子:
4
通讯作者:
Bashir, R
Bashir, R
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Elibol, OH;Morisette, D;Bashir, R

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