Epitaxial growth of thermally stable cobalt films on Au(111)
Epitaxial growth of thermally stable cobalt films on Au(111)
复制标题
Au(111) 上热稳定钴薄膜的外延生长
DOI:
10.1088/1367-2630/18/10/103054
复制
发表时间:
2016
影响因子:
3.3
通讯作者:
M. Aeschlimann
中科院分区:
文献类型:
--
作者:
N. Haag;M. Laux;J. Stöckl;J. Kollamana;J. Seidel;N. Großmann;R. Fetzer;L. L. Kelly;Z. Wei;B. Stadtmüller;M. Cinchetti;M. Aeschlimann
Ferromagnetic thin films play a fundamental role in spintronic applications as a source for spin polarized carriers and in fundamental studies as ferromagnetic substrates. However, it is challenging to produce such metallic films with high structural quality and chemical purity on single crystalline substrates since the diffusion barrier across the metal-metal interface is usually smaller than the thermal activation energy necessary for smooth surface morphologies. Here, we introduce epitaxial thin Co films grown on an Au (111) single crystal surface as a thermally stable ferromagnetic thin film. Our structural investigations reveal an identical growth of thin Co/Au (111) films compared to Co bulk single crystals with large monoatomic Co terraces with an average width of 500 Å, formed after thermal annealing at 575 K. Combining our results from photoemission and Auger electron spectroscopy, we provide evidence that no significant diffusion of Au into the near surface region of the Co film takes place for this temperature and that no Au capping layer is formed on top of Co films. Furthermore, we show that the electronic valence band is dominated by a strong spectral contribution from a Co 3d band and a Co derived surface resonance in the minority band. Both states lead to an overall negative spin polarization at the Fermi energy.
登录
查看更多内容
影响因子:
2.7
作者:
J. Miguel;A. Cebollada;J. Gallego;R. Miranda;Claus M. Schneider;P. Schuster;J. Kirschner
通讯作者:
J. Kirschner
影响因子:
2.7
作者:
J.-P. Wüstenberg;M. Cinchetti;M. Sánchez Albaneda;M. Bauer;M. Aeschlimann
通讯作者:
M. Aeschlimann
DOI:
10.1088/0022-3727/41/16/164003
发表时间:
2008
期刊:
影响因子:
--
作者:
A. Schmidt;M. Pickel;T. Allmers;M. Budke;J. Braun;M. Weinelt;M. Donath
通讯作者:
M. Donath
影响因子:
3.7
作者:
CLEMENS, W;VESCOVO, E;EBERHARDT, W
通讯作者:
EBERHARDT, W
DOI:
--
发表时间:
2004
期刊:
Appl.Surf.Sci. 237
影响因子:
--
作者:
Hideki Fujisawa;Susumu Siraki;Maki Kawai;et al.
通讯作者:
et al.