Development of 157-nm small-field and mid-field microsteppers
Development of 157-nm small-field and mid-field microsteppers
复制标题
157 nm 小视场和中视场微步进器的开发
DOI：
10.1117/12.388998
复制
发表时间：
2000
影响因子：
15
通讯作者：
G. Fong
中科院分区：
文献类型：
--
作者：
Ron Miller;P. Bischoff;Roger C. Sumner;S. W. Bowler;W. Flack;G. Fong
光学光刻技术不断发展到100 nm以下的图案化能力，需要利用更短的曝光波长，如157 nm。这又需要在透镜性能和步进器主体性能方面的修改。折射率均匀性的进步使得开发适合于研究亚100 nm光刻的157 nm透镜系统成为可能。在作为掩模版材料的改性熔融石英的透射率方面的最新进展使得更期望追求157nm光刻工具。MicroSteppers是获得光刻胶和工艺信息的必要工具，这些信息与该技术在100 nm和70 nm器件节点上的生产效率有关。
The continuos advancement of optical lithography into the regime of sub-100nm patterning capability requires the utilization of shorter exposure wavelengths such as 157nm. This in turn requires modifications in lens performance and stepper body performance. Advances in index homogeneity have made it possible to develop 157nm lens systems suitable for investigating sub-100nm lithography. Recent advances in the transmission of modified fused silica as a reticle material have made it more desirable to pursue 157nm lithography tools. MicroSteppers are a necessary vehicle to obtain photoresist and process information pertaining to the efficacy of this technology for production at the 100nm and 70nm device nodes.