A versatile diffractive maskless lithography for single-shot and serial microfabrication.
A versatile diffractive maskless lithography for single-shot and serial microfabrication.
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DOI：
10.1364/oe.18.011754
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发表时间：
2010-05-24
期刊：
影响因子：
3.8
通讯作者：
Clark RL
中科院分区：
文献类型：
--
作者：
Jenness NJ;Hill RT;Hucknall A;Chilkoti A;Clark RL
我们展示了一个衍射无掩模光刻系统，能够快速执行串行和单次拍摄微图案。利用空间光调制器上显示的相位全息图的衍射特性，产生任意强度分布以在各种基底上形成二维和三维微图案/结构。实现了一个简单的图形用户界面，允许用户在几分钟内加载模板和更改图案模式。两种图案化模式的最小分辨率为~700 nm，这与瑞利准则预测的232 nm分辨率极限相比是有利的。所提出的方法是快速和适应性强，允许在光致抗蚀剂中的微结构的并行制造以及保留功能活性的蛋白质微结构的制造。
We demonstrate a diffractive maskless lithographic system that is capable of rapidly performing both serial and single-shot micropatterning. Utilizing the diffractive properties of phase holograms displayed on a spatial light modulator, arbitrary intensity distributions were produced to form two and three dimensional micropatterns/structures in a variety of substrates. A straightforward graphical user interface was implemented to allow users to load templates and change patterning modes within the span of a few minutes. A minimum resolution of ~700 nm is demonstrated for both patterning modes, which compares favorably to the 232 nm resolution limit predicted by the Rayleigh criterion. The presented method is rapid and adaptable, allowing for the parallel fabrication of microstructures in photoresist as well as the fabrication of protein microstructures that retain functional activity.