Effect of sulfur on oxygen adsorption and oxidation of the Ni(111) surface
Effect of sulfur on oxygen adsorption and oxidation of the Ni(111) surface
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DOI：
10.1116/1.577966
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发表时间：
1992-07
期刊：
影响因子：
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通讯作者：
Jun Liu;J. P. Lu;P. Chu;J. Blakely
中科院分区：
文献类型：
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作者：
Jun Liu;J. P. Lu;P. Chu;J. Blakely
在超高真空条件下，用俄歇电子能谱、低能电子衍射和X射线光电子能谱研究了在室温下，硫(S)对氧的化学吸附和Ni(111)晶面氧化初期的影响。结果表明，硫对氧的吸附动力学有明显的抑制作用，但不改变氧化机理。初始化学吸附黏附系数(S)遵循S∝(1−3θS)2的关系，其中θS为S的覆盖率。S预复层表面的氧化可用岛状生长模型较好地描述，氧化速率相对于无S表面的氧化速率的降低可归因于氧化核密度的降低。一些实验观察表明，S在440K时部分去除了氧化层，硫被认为在氧化过程中留在了Ni/NiO界面上。
The effect of sulfur (S) on oxygen chemisorption and the initial stages of oxidation of the Ni(111) crystal surface have been studied with Auger electron spectroscopy, low‐energy electron diffraction, and x‐ray photoelectron spectroscopy at room temperature under ultrahigh vacuum conditions. It is found that sulfur strongly retards the oxygen adsorption kinetics, but does not change the oxidation mechanism. The initial chemisorption sticking coefficient (s) is found to follow the relationship s ∝ (1 − 3θs)2, where θs is the S coverage. Oxidation of S precovered surfaces can be described fairly well by an island growth model; the decrease in oxidation rate, relative to that of the S‐free surface, can be attributed to the reduction in the density of oxide nuclei. Some experimental observations indicate that the oxide layer is partially removed by S at 440 K. Sulfur is believed to remain at the Ni/NiO interface during oxidation.