A statistical approach to correct X-ray response non-uniformity in microstrip detectors for high-accuracy and high-resolution total-scattering measurements
A statistical approach to correct X-ray response non-uniformity in microstrip detectors for high-accuracy and high-resolution total-scattering measurements
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DOI：
10.1107/s1600577519002145
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发表时间：
2019-05-01
影响因子：
2.5
通讯作者：
Hatsui, Takaki
中科院分区：
文献类型：
--
作者：
Kato, Kenichi;Tanaka, Yoshihito;Hatsui, Takaki
本文提出了一种修正微带探测器X射线响应非均匀性的无偏方法，该方法基于泊松噪声中目标在固定角度处的散射强度为常数的统计估计。发现由微带检测器模块测量的SiO2玻璃的原始散射数据在10（6）个光子的强度下显示出12 sigma（PN）的精度，其中sigma（PN）是根据泊松噪声的标准偏差。传统的平场校准无法校正数据，而本文中使用的替代方法成功地将精度从12 sigma（PN）提高到2 sigma（PN）。这种方法被应用到总散射数据测量的无间隙15模块化检测器系统。数据的质量进行了评价方面的Bragg反射的Si粉，SiO2玻璃的漫散射，和原子对分布函数的TiO2纳米粒子和Ni粉。
An unbiased approach to correct X-ray response non-uniformity in microstrip detectors has been developed based on the statistical estimation that the scattering intensity at a fixed angle from an object is expected to be constant within the Poisson noise. Raw scattering data of SiO2 glass measured by a microstrip detector module was found to show an accuracy of 12 sigma(PN) at an intensity of 10(6) photons, where sigma(PN) is the standard deviation according to the Poisson noise. The conventional flat-field calibration has failed in correcting the data, whereas the alternative approach used in this article successfully improved the accuracy from 12 sigma(PN) to 2 sigma(PN). This approach was applied to total-scattering data measured by a gapless 15-modular detector system. The quality of the data is evaluated in terms of the Bragg reflections of Si powder, the diffuse scattering of SiO2 glass, and the atomic pair distribution function of TiO2 nanoparticles and Ni powder.