Micro-optical distance sensor fabricated by deep x-ray lithography
Micro-optical distance sensor fabricated by deep x-ray lithography
复制标题
采用深X射线光刻技术制造的微型光学距离传感器
DOI：
10.1117/1.1387987
复制
发表时间：
2001
影响因子：
1.3
通讯作者：
T. Usami
中科院分区：
文献类型：
--
作者：
H. Nakajima;P. Ruther;J. Mohr;M. Tsugai;T. Usami
生产出尺寸小于5mm见方的全光学超小型位移测量传感器头。该传感器通过光学三角测量来工作。为了实现光学功能，该传感器由深X射线光刻（LIGA）图案化的三层聚合物波导、光输入光纤、两根检测光纤和微柱透镜组成，这些透镜也由深X射线光刻制造。通过使用波导壁作为引导和固定结构，光纤和柱面透镜被放置到波导中，无需任何主动对准。两根检测光纤中检测到的强度之比就是物体与传感器之间距离的量度。在传感器与具有漫反射表面的物体之间2至3毫米的范围内，可实现约10μm的高分辨率。
An all optical ultraminiaturized sensor head for displacement measurement that has a size of less than 5 mm in square has been produced. The sensor works by means of optical triangulation. To achieve the optical function, the sensor consists of a three-layer polymer waveguide patterned by deep x-ray lithography (LIGA), a light input fiber, two detection fibers, and microcylindrical lenses, which are also fabricated by deep x-ray lithography. The fibers and the cylindrical lenses are placed into the waveguide without any active alignment by using the waveguide walls as guiding and fixing structures. The ratio of the intensities detected in the two detection fibers is the measure of the distance between the object and the sensor. High resolution of about 10 ?m is achieved in the range of 2 to 3 mm between the sensor and an object with a diffusively reflecting surface.