Electronic structure and deposition behavior of superlattice chalcogenide films
Electronic structure and deposition behavior of superlattice chalcogenide films
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超晶格硫族化物薄膜的电子结构和沉积行为
DOI:
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发表时间:
2014
期刊:
影响因子:
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通讯作者:
and Takashi Nakano
中科院分区:
文献类型:
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作者:
Yuta Saito;Junji Tominaga;Kotaro Makino;Xiaomin Wang;Alexander V. Kolobov;Paul Fons;and Takashi Nakano