Beyond Extreme Ultra Violet (BEUV) Radiation from Spherically symmetrical High-Z plasmas
Beyond Extreme Ultra Violet (BEUV) Radiation from Spherically symmetrical High-Z plasmas
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来自球对称高 Z 等离子体的超强紫外线 (BEUV) 辐射
DOI：
10.1088/1742-6596/688/1/012046
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发表时间：
2016
期刊：
影响因子：
--
通讯作者：
Hirosh
中科院分区：
文献类型：
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作者：
Kensuke Yoshida;Shinsuke Fujioka;Takeshi Higashiguchi;Teruyuki Ugomori;Nozomi Tanaka;Masato Kawasaki;Yuhei Suzuki;Chihiro Suzuki;Kentaro Tomita;Ryouichi Hirose;Takeo Ejima;Hayato Ohashi;Masaharu Nishikino;Enda Scally;Hiroaki Nshimura;Hirosh
光刻技术是实现高性能、小型化半导体器件批量生产的关键技术。通过在光刻中使用较短波长的光可以制造更小和更复杂的结构。下一代光刻技术发展的关键问题之一是提高激光到短波长光的能量转换效率。利用球对称高Z等离子体产生超极紫外辐射，获得了超极紫外辐射实验数据。用绝对校准的BEUV量热计和透射光栅光谱仪测量了Tb、Gd和Mo等离子体发射的BEUV光的绝对能量和光谱。1.0 x 10 12 W/cm 2是产生高效率的Tb和Gd靶BEUV光源等离子体的最佳激光强度。最大CE达到0.8%，比用平面靶获得的已发表CE高两倍。
Photo-lithography is a key technology for volume manufacture of high performance and compact semiconductor devices. Smaller and more complex structures can be fabricated by using shorter wavelength light in the photolithography. One of the most critical issues in development of the next generation photo-lithography is to increase energy conversion efficiency (CE) from laser to shorter wavelength light. Experimental database of beyond extreme ultraviolet (BEUV) radiation was obtained by using spherically symmetrical high-Z plasmas generated with spherically allocated laser beams. Absolute energy and spectra of BEUV light emitted from Tb, Gd, and Mo plasmas were measured with a absolutely calibrated BEUV calorimeter and a transmission grating spectrometer. 1.0 x 10 12 W/cm 2 is the optimal laser intensity to produced efficient BEUV light source plasmas with Tb and Gd targets. Maximum CE is achieved at 0.8% that is two times higher than the published CEs obtained with planar targets.