SiC Complementary Junction Field-Effect Transistor Logic Gate Operation at 623 K

SiC Complementary Junction Field-Effect Transistor Logic Gate Operation at 623 K
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DOI:
10.1109/led.2022.3179129
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发表时间:
2022-07-01
影响因子:
4.9
通讯作者:
Kimoto, T.
Kimoto, T.
中科院分区:
工程技术2区
文献类型:
--
作者:
Kaneko, M.;Nakajima, M.;Kimoto, T.

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在这里,我们表明,碳化硅(SiC)的互补逻辑门组成的p-和n-沟道结型场效应晶体管(JFET)的离子注入制造的工作在623 K的电源电压低至1.4 V的互补JFET(CJFET)反相器的逻辑阈值电压漂移仅为0.2 V,从300至623 K。此外,CJFET逆变器的静态和动态特性的温度依赖性很好地解释了一个简单的SiC JFET的分析模型。
Here, we show that silicon carbide (SiC) complementary logic gates composed of p- and n-channel junction field-effect transistors (JFETs) fabricated by ion implantation operate at 623 K with a supply voltage as low as 1.4 V. The logic threshold voltage shift of the complementary JFET (CJFET) inverter is only 0.2 V from 300 to 623 K. Furthermore, temperature dependencies of the static and dynamic characteristics of the CJFET inverter are well explained by a simple analytical model of SiC JFETs.