Large-scale ordered silicon microtube arrays fabricated by Poisson spot lithography
Large-scale ordered silicon microtube arrays fabricated by Poisson spot lithography
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DOI：
10.1088/0957-4484/22/39/395301
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发表时间：
2011-09
期刊：
影响因子：
3.5
通讯作者：
S. Tian;Xiaoxiang Xia;Wangning Sun;Wuxia Li;Junjie Li;C. Gu
中科院分区：
文献类型：
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作者：
S. Tian;Xiaoxiang Xia;Wangning Sun;Wuxia Li;Junjie Li;C. Gu
提出了一种基于传统光学光刻系统中的泊松光斑效应以低成本制造大规模有序环形图形的新方法，该方法通过控制曝光剂量和精心设计掩模图形来调节图形几何形状。在此之后，通过深低温刻蚀，将环形图案转移到硅衬底上，形成各种垂直管状硅阵列结构。微观分析表明，所制备的硅微管内外表面光滑，大小、形状和壁厚均匀，在电子、生物和医疗等领域具有潜在的应用前景。
A novel approach based on the Poisson spot effect in a conventional optical lithography system is presented for fabricating large-scale ordered ring patterns at low cost, in which the pattern geometries are tuned by controlling the exposure dose and deliberate design of the mask patterns. Following this by cryogenic deep etching, the ring patterns are transferred into Si substrates, resulting in various vertical tubular Si array structures. Microscopic analysis indicates that the as-fabricated Si microtubes have smooth interior and exterior surfaces that are uniform in size, shape and wall-thickness, which exhibit potential applications as electronic, biological and medical devices.