Theoretical enthalpies of formation for small silicon hydrides

Theoretical enthalpies of formation for small silicon hydrides
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小氢化硅的理论生成焓

DOI:
10.1021/j100157a052
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发表时间:
1991
期刊:
影响因子:
--
通讯作者:
J. Kalcher
J. Kalcher
中科院分区:
--
文献类型:
--
作者:
A. Sax;J. Kalcher

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采用高质量的电子结构方法(多构型参考波函数、单-双构型相互作用),结合经验键焓修正,计算了27个硅原子分子体系的生成焓(Δ fH ○-298)和生成吉布斯函数(Δ fG ○- 298
Enthalpies of formation (Δ f H ○- 298 ) and Gibbs functions of formation (Δ f G ○- 298 ) for 27 molecular systems with up to three silicon atoms were calculated with high-quality electronic structure methods (multiconfigurational reference wave functions, singles-doubles configuration interaction) in combination with empirical bond enthalpy corrections