Applications of Electron Holography
Applications of Electron Holography
复制标题
电子全息术的应用
DOI：
10.1007/978-1-4615-4817-1_12
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发表时间：
1999
影响因子：
1.6
通讯作者：
A. Carim
中科院分区：
文献类型：
--
作者：
M. Gajdardziska;A. Carim
电子全息技术现在正处于以技术开发为重点，慢慢转向以应用为重点的阶段。对于中等分辨率的电子全息术尤其如此，其中相位图像提供有关样品中以及样品周围空间中的静电和磁场的信息。通常无法从通过非全息显微技术获得的强度图像中获得此类信息。这就是为什么大多数已发表的电子全息术应用都与电磁场的研究有关。本书的第 7 章和第 8 章已经专门讨论了通过离轴电子全息术研究电磁场的理论和实验方面。为了避免重复，在本章中，我们将仅讨论中等分辨率电子全息术在样品中没有强静电和/或磁场的情况下的应用。在这种情况下，相位主要受平均内电势和材料厚度的影响，另外还有衍射效应的影响。我们将首先讨论这三个依赖关系，作为随后回顾全息术在界面、表面和小粒子方面的应用的背景。
Electron holography is now at the stage where the emphasis on technique development is slowly shifting towards an emphasis on applications. This is particularly true for electron holography at moderate resolutions, where the phase image gives information about electrostatic and magnetic fields in the sample and in the space around the sample. Such information is not normally available from the intensity images obtained by non-holographic microscopy techniques. This is why most of the published applications of electron holography have been concerned with studies of electromagnetic fields. This book has already devoted Chapter 7 and Chapter 8 to the theoretical and experimental aspects of studying electromagnetic fields by off-axis electron holography. To avoid duplication, in this chapter we will only discuss applications of moderate resolution electron holography to cases when there are no strong electrostatic and/or magnetic fields in the samples. The phase in this case is mainly affected by the mean inner potential and the thickness of the material, with additional contributions from diffraction effects. We will first discuss these three dependencies as a background for the ensuing review of applications of holography to interfaces, surfaces and small particles.