Photodynamic inhibition of Trichophyton rubrum: in vitro activity and the role of oxidative and nitrosative bursts in fungal death
Photodynamic inhibition of Trichophyton rubrum: in vitro activity and the role of oxidative and nitrosative bursts in fungal death
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DOI:
10.1093/jac/dks414
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发表时间:
2013-02-01
影响因子:
5.2
通讯作者:
Cisalpino, Patricia Silva
中科院分区:
文献类型:
--
作者:
Baltazar, Ludmila de Matos;Soares, Betania Maria;Cisalpino, Patricia Silva
Antimicrobial photodynamic inhibition (aPI) is based on the use of a light source and a photosensitizer to kill pathogens. Little is known about aPI of dermatophytic fungi and its mechanism of action. We aimed to evaluate aPI of Trichophyton rubrum.We performed tests using toluidine blue (TBO) as a photosensitizer and a 630 nm light-emitting diode (LED) as a source of light to target 12 T. rubrum isolates. Susceptibility testing with cyclopiroxolamine, timekill curves and quantification of reactive oxygen species (ROS), peroxynitrite (ONOO) and nitric oxide (NO) were performed.The optimal conditions for in vitro aPI were 10 mg/L for TBO and 48 J/cm(2) for LED; these conditions were fungicidal or inhibited 98 of fungal growth depending on the strain tested. LED or TBO treatment alone did not inhibit growth. The MICs of cyclopiroxolamine were 2.0 mg/L for 90 of the strains. Analysis of timekill curves revealed that pathogen death occurred 24 h post-treatment. Quantification of ROS, ONOO and NO revealed improvement after aPI.Photodynamic inhibition was more efficient in promoting cell death than the antifungal cyclopiroxolamine against T. rubrum. ROS, ONOO and NO were important in the fungicidal activity of aPI. A suggested mechanism for this activity is that TBO is excited by LED light (630 nm), reacts with biomolecules and increases the availability of transition electrons and substrates for nitric oxide synthase, thereby increasing the oxidative and nitrosative bursts in the fungal cell.