Thin film deposition on powder surfaces using atmospheric pressure discharge

Thin film deposition on powder surfaces using atmospheric pressure discharge
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利用大气压放电在粉末表面进行薄膜沉积

DOI：
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发表时间：
2005
期刊：
影响因子：
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通讯作者：
H. Kersten
H. Kersten
中科院分区：
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文献类型：
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作者：
V. Brüser;M. Hähnel;H. Kersten

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研究了常压介质阻挡放电条件下含SiOx膜在NaCl和KBr颗粒上的沉积。以六甲基二硅氧烷（HMDSO）和四乙氧基硅氧烷（TEOS）为前驱体，在氩气-氧气混合物中进行了研究。采用光镜、扫描电镜和XPS对沉积层进行了研究。这些颗粒可能被SiOx完全覆盖。随着涂层中氧含量的增加，碳含量降低。
The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon‐oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases.