Linewidth calibration using a metrological atomic force microscope with a tip-tilting mechanism
Linewidth calibration using a metrological atomic force microscope with a tip-tilting mechanism
复制标题
使用具有尖端倾斜机构的计量原子力显微镜进行线宽校准
DOI：
10.1088/1361-6501/aaf02a
复制
发表时间：
2018
影响因子：
2.4
通讯作者：
Gonda Satoshi
中科院分区：
文献类型：
--
作者：
Kizu Ryosuke;Misumi Ichiko;Hirai Akiko;Kinoshita Kazuto;Gonda Satoshi
利用具有倾斜机制的计量原子力显微镜（titing - mafm）对纳米线的线宽或临界尺寸（CD）进行校准。倾斜的尖端允许扫描线条图案的垂直侧壁。倾斜- mam对线模式的每侧进行两次测量，并将两个数据集拼接在一起以重建线模式的完整形状。此外，CD是基于此模式测量的。采用亚纳米尺度不确定度的线宽标准作为目标样品，验证了该CD校准程序。使用倾斜- afm校准的CD为111.2 nm，扩展不确定度为1.0 nm，这是使用倾斜- afm仪器测量CD时观察到的最小不确定度。此外，该CD值与参考CD值之间的差异仅为0.2 nm。结果表明，该方法可用于单纳米精度的CD测量。
The linewidth or critical dimension (CD) of a nanoscale line pattern is calibrated using a metrological atomic force microscope with a tip-tilting mechanism (tilting-mAFM). The tilting tip permits the scanning of the line pattern's vertical sidewalls. The tilting-mAFM performs two measurements on each side of the line pattern, and two datasets are stitched together to reconstruct the complete shape of the line pattern. Further, the CD is measured based on this pattern. A linewidth standard with a subnanometer-scale uncertainty was used as a target sample to verify this CD calibration procedure. The calibrated CD using the tilting-mAFM was 111.2 nm with an expanded uncertainty of 1.0 nm, which was the smallest uncertainty that was observed among the CD measurements that were reported using the tilting-AFM instruments. Further, the difference between this CD value and the reference CD was only 0.2 nm. The results reveal that the tilting-mAFM can be used for CD metrology with single-nanometer accuracy.