THERMOCHEMICAL NITRIDATION OF MICROPOROUS SILICA FILMS IN AMMONIA
THERMOCHEMICAL NITRIDATION OF MICROPOROUS SILICA FILMS IN AMMONIA
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DOI：
10.1111/j.1151-2916.1987.tb04845.x
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发表时间：
1987-01-01
影响因子：
3.9
通讯作者：
PANTANO, CG
中科院分区：
文献类型：
--
作者：
BROW, RK;PANTANO, CG
用正硅酸乙酯、乙醇和水的溶液在硅衬底上沉积了微孔二氧化硅薄膜。这些通过与氨的高温反应转化为致密的氮氧化物。氨处理产生的非晶，成分均匀的膜与总的氮含量范围高达40摩尔%。对于低于800°C的氨处理，将氮作为胺物质掺入膜中，而较高温度的处理产生氮化物材料。
Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.