Calibration of Inductance Calculations to Measurement Data for Superconductive Integrated Circuit Processes
Calibration of Inductance Calculations to Measurement Data for Superconductive Integrated Circuit Processes
复制标题
超导集成电路工艺测量数据的电感计算校准
DOI：
10.1109/tasc.2012.2234815
复制
发表时间：
2013
影响因子：
1.8
通讯作者：
C. Fourie
中科院分区：
文献类型：
--
作者：
C. Fourie
很容易调整场解算器电感提取模型的参数，以适应单个测量。然而，需要更多的努力来校准一个模型的线宽，层，和制造运行的代表性集合。数值计算的电感也是段尺寸的强函数。选择段大小以优化大RSFQ逻辑单元的提取精度与速度。然后根据此段尺寸校准InductEx。来自不同宽度和层的54个测试结构的测量数据，在Hypres的4.5 kA/cm 2掩模对准器工艺的22个晶片上的许多芯片上重复，以及来自用于晶片步进器工艺的5个晶片的48个测试结构，被用来找到Hypres工艺平均值。人工改变InductEx层参数，如掩模-晶圆偏置和穿透深度，首先减少不同宽度结果之间的偏差，然后减少层间差异。这将为Hypres的掩模对准器和晶圆步进机工艺提供一组用于电感计算的校准工艺参数。在0.8 μm ~ 20 μm的线宽范围内，校正电感的计算结果与平均测量值一致，均方根误差小于2.3%，表明InductEx是一种有用的窄线电感计算工具。
It is easy to adjust the parameters for field-solver inductance extraction models to fit a single measurement. However, more effort is required to calibrate a model for a representative collection of line widths, layers, and fabrication runs. Numerically calculated inductance is also a strong function of segment size. A segment size is selected to optimize extraction accuracy versus speed for large RSFQ logic cells. InductEx is then calibrated for this segment size. Measured data from 54 test structures of different widths and layers, repeated on many chips over 22 wafers of Hypres's 4.5 kA/cm2 mask aligner process and 48 test structures from 5 wafers for the wafer stepper process, were used to find the Hypres process averages. Artificial changes to InductEx layer parameters such as mask-wafer bias and penetration depth are used to first reduce skew between results for different widths, and then differences between layers. This results in a set of calibrated process parameters for inductance calculations with InductEx for both the mask aligner and wafer stepper processes from Hypres. Calibrated inductance calculation results agree with the average measurements with a root-mean-square error smaller than 2.3% over the full range of line widths from 0.8 μm to 20 μm, showing InductEx as a useful tool for narrow-line inductance calculations.