Measured Emittance Dependence on the Injection Method in Laser Plasma Accelerators

Measured Emittance Dependence on the Injection Method in Laser Plasma Accelerators
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DOI:
10.1103/physrevlett.119.104801
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发表时间:
2017-09-05
影响因子:
8.6
通讯作者:
Leemans, W. P.
Leemans, W. P.
中科院分区:
物理与天体物理1区
文献类型:
--
作者:
Barber, S. K.;van Tilborg, J.;Leemans, W. P.

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单次发射,电荷相关的发射度测量的激光等离子体加速器(LPA)产生的电子束显示,冲击引起的密度下降斜坡注入产生的光束与归一化发射度的一个因素2小于通过电离注入产生的光束。这种比较是可能的可调LPA设置,它允许电子束具有几乎相同的中心能量和峰值光谱电荷密度使用两种不同的注入机制产生。这种类型的参数测量是必不可少的LPA为基础的应用,最终需要高电荷密度和低发射度的发展。
Single-shot, charge-dependent emittance measurements of electron beams generated by a laser plasma accelerator (LPA) reveal that shock-induced density down-ramp injection produces beams with normalized emittances a factor of 2 smaller than beams produced via ionization injection. Such a comparison is made possible by the tunable LPA setup, which allows electron beams with nearly identical central energy and peak spectral charge density to be produced using the two distinct injection mechanisms. Parametric measurements of this type are essential for the development of LPA-based applications which ultimately require high charge density and low emittance.