Status report: solar cell related research and development using amorphous and microcrystalline silicon deposited by HW(Cat)CVD
Status report: solar cell related research and development using amorphous and microcrystalline silicon deposited by HW(Cat)CVD
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DOI：
10.1016/s0040-6090(03)00070-1
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发表时间：
2003-04-22
期刊：
影响因子：
2.1
通讯作者：
Schroeder, B
中科院分区：
文献类型：
--
作者：
Schroeder, B
本文综述了利用热丝化学气相沉积（HWCVD）技术制备a-Si：H和muc-Si：H基太阳能电池的研究进展。所涉及的群体和转换效率达到的现状列出，并将讨论不同的细胞结构实现完全或部分使用这种方法。HWCVD具有三个主要优点：设备简单、可用沉积速率高和HW-a-Si：H稳定性高。将讨论如何利用这些优点，使HWCVD等离子体增强化学气相沉积的替代品。(C)2003 Elsevier Science B. V.保留所有权利。
This article reviews the research and development of a-Si:H and muc-Si:H based solar cells by using hot wire chemical vapor deposition (HWCVD). The groups involved and the present status of conversion efficiencies attained are listed and will be discussed for different cell structures realized entirely or partly using this method. There are three main advantages of HWCVD: a quite simple set up, higher useable deposition rates and higher stability of HW-a-Si:H. It will be discussed how these advantages can be exploited to make HWCVD an alternative to plasma enhanced chemical vapor deposition. (C) 2003 Elsevier Science B.V. All rights reserved.