Versatile construction of van der Waals heterostructures using a dual-function polymeric film

Versatile construction of van der Waals heterostructures using a dual-function polymeric film
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DOI:
10.1038/s41467-020-16817-1
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发表时间:
2020-06-15
影响因子:
16.6
通讯作者:
Shahrjerdi, Davood
Shahrjerdi, Davood
中科院分区:
综合性期刊1区
文献类型:
--
作者:
Huang, Zhujun;Alharbi, Abdullah;Shahrjerdi, Davood

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通过堆叠层状材料形成的范德华(vdW)异质结构的扩散可以加速科学技术的进步。在这里,我们报告了一种通过使用亚 5 nm 聚合物薄膜的剥离基底的界面工程构建 vdW 异质结构的策略。我们的施工方法有两个区别于现有技术的主要特征。首先是其剥离过程在提高产量和生产大尺寸(>10,000 μ m(2))单层石墨烯方面的一致性。其次是其层转移工艺适用于不同的层状材料,而不需要专门的印模——这一功能对于推广组装工艺非常有用。我们展示了 vdW 石墨烯器件在室温和 9K 下的峰值载流子迁移率分别为 200,000 和 800,000cm(2) V-1 s(-1)。我们的构造方法的简单性及其对不同层状材料的多功能性可能为 vdW 异质结构制造过程的自动化打开大门。
The proliferation of van der Waals (vdW) heterostructures formed by stacking layered materials can accelerate scientific and technological advances. Here, we report a strategy for constructing vdW heterostructures through the interface engineering of the exfoliation substrate using a sub-5 nm polymeric film. Our construction method has two main features that distinguish it from existing techniques. First is the consistency of its exfoliation process in increasing the yield and in producing large (>10,000 mu m(2)) monolayer graphene. Second is the applicability of its layer transfer process to different layered materials without requiring a specialized stamp-a feature useful for generalizing the assembly process. We demonstrate vdW graphene devices with peak carrier mobility of 200,000 and 800,000cm(2) V-1 s(-1) at room temperature and 9K, respectively. The simplicity of our construction method and its versatility to different layered materials may open doors for automating the fabrication process of vdW heterostructures.