Photo‐Curable Polymer Blend Dielectrics for Advancing Organic Field‐Effect Transistor Applications
Photo‐Curable Polymer Blend Dielectrics for Advancing Organic Field‐Effect Transistor Applications
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DOI：
10.1002/adma.201000904
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发表时间：
2010-11
影响因子：
29.4
通讯作者：
Se Hyun Kim;K. Hong;M. Jang;Jaeyoung Jang;J. Anthony;Hoichang Yang;Chan Eon Park
中科院分区：
文献类型：
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作者：
Se Hyun Kim;K. Hong;M. Jang;Jaeyoung Jang;J. Anthony;Hoichang Yang;Chan Eon Park
介绍了一种用聚（4-二甲基硅基苯乙烯）（PDMSS）和聚（三聚氰胺-共甲醛）丙烯酸酯（PMFA）共混溶液制备可光固化和可图案化聚合物栅极电介质的方法。优化了制备工艺，制备出具有良好绝缘性能和耐溶剂性能的光滑疏水栅极电介质。在优化后的PDMSS/PMFA混合栅极介质上，并五苯可以生长成高度有序的结构，所制备的ofet、PTCDI-C13和TES-ADT具有较高的电学性能。
A solution method of photo-curable and -patternable polymer gate dielectrics was introduced by using blend solutions of poly(4-dimethylsilyl styrene) (PDMSS) and poly(melamine-co-formaldehyde) acrylate (PMFA). The fabrication was optimized to produce a smooth hydrophobic gate dielectric with good insulating and solvent-resistant properties. On the optimized PDMSS/PMFA blend gate dielectric, pentacene could grow into highly ordered structure, showing high electric performances for the resulting OFETs, as well as PTCDI-C13 and TES-ADT.