Epitaxial growth and surface metallic nature of LaNIO3 thin films
Epitaxial growth and surface metallic nature of LaNIO3 thin films
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DOI：
10.1063/1.2955534
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发表时间：
2008-07
影响因子：
4
通讯作者：
K. Tsubouchi;I. Ohkubo;H. Kumigashira;Y. Matsumoto;T. Ohnishi;M. Lippmaa;H. Koinuma;M. Oshima
中科院分区：
文献类型：
--
作者：
K. Tsubouchi;I. Ohkubo;H. Kumigashira;Y. Matsumoto;T. Ohnishi;M. Lippmaa;H. Koinuma;M. Oshima
采用脉冲激光沉积和高压反射高能电子衍射（RHEED）相结合的方法成功地实现了LaNiO3（LNO）薄膜在高氧压下的原位外延生长控制。RHEED振荡，外延逐层生长的指示，清楚地观察到在LNO沉积在最佳条件下。膜表面由原子级平坦的台阶和台阶组成。详细的光电子能谱分析显示，在最佳的氧气压力下生长的LNO，Ni离子假设一个均匀的Ni3+高价态，得到的金属性能被保存，即使在表面和LNO和LaAlO3衬底之间的界面区域。
In situ epitaxial growth control of LaNiO3 (LNO) films at high oxygen pressure has been successfully achieved using a combination of pulsed laser deposition and high-pressure reflection high-energy electron diffraction (RHEED). RHEED oscillations, indicative of epitaxial layer-by-layer growth, were clearly observed during LNO deposition under optimal conditions. The film surfaces were composed of atomically flat terraces and steps. Detailed photoelectron spectroscopy analysis of LNO grown at the optimal oxygen pressure revealed that Ni ions assume a uniform Ni3+ high-valence state and that the resultant metallic properties are preserved even at the surface and in the interface region between LNO and the LaAlO3 substrate.