Ordering of self-assembled 5-nm-diameter poly(dimethylsiloxane) nanodots with sub-10 nm pitch using ultra-narrow electron-beam-drawn guide lines and three-dimensional control
Ordering of self-assembled 5-nm-diameter poly(dimethylsiloxane) nanodots with sub-10 nm pitch using ultra-narrow electron-beam-drawn guide lines and three-dimensional control
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DOI：
10.1063/1.4867981
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发表时间：
2014-03
影响因子：
4
通讯作者：
Hui Zhang;S. Hosaka;Y. Yin
中科院分区：
文献类型：
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作者：
Hui Zhang;S. Hosaka;Y. Yin
我们证明了使用引导线模板和低分子量（MW）（4700-1200 g/mol）聚（苯乙烯）-聚（二甲基硅氧烷）（PS-PDMS）形成间距为10 × 7. 5 nm 2的直径为5 nm的纳米点的长程有序自组装阵列的可能性，其可用于高密度图案化磁记录介质。我们提出了一种三维控制，其中涉及控制的高度的引导线，PS-PDMS膜的厚度，和引导线之间的差距，以产生5 nm直径，子10 nm间距的纳米点与长程有序沿着引导线。采用13 nm厚的PS-PDMS膜和14 nm高的抗蚀剂引导线，将直径为5 nm、间距为10 × 7. 5 nm 2的自组装纳米点有序排列成4-7个长程有序点阵列。实验结果表明，该方法是适合于生产的图案化介质的磁记录密度为8.6 Tbit/in.2，使用低MW的PS-PDMS和细长的引导线。
We demonstrate the possibility of forming long-range ordered self-assembled arrays of 5-nm-diameter nanodots with pitch of 10 × 7.5 nm2 using guide line templates and low molecular weight (MW) (4700–1200 g/mol) poly(styrene)-poly(dimethylsiloxane) (PS-PDMS) for application in ultrahigh density patterned magnetic recording media. We propose a three-dimensional control which involves control of the height of the guide lines, the thickness of the PS-PDMS films, and the gap between the guide lines in order to produce 5-nm-diameter, sub-10 nm pitched nanodots with long-range order along the guide lines. Adopting a 13-nm-thick PS-PDMS film and 14-nm-high resist guide lines, the 5-nm-diameter and 10 × 7.5 nm2-pitched self-assembled nanodots were ordered in 4–7 dot arrays with long-range order. The experimental results demonstrate that the method is suitable for the production of patterned media with magnetic recording densities of 8.6 Tbit/in.2 using low MW PS-PDMS and slim guide lines.