Method for the analysis of nonselective spectra of optically stimulated electron emission from irradiated dielectrics
Method for the analysis of nonselective spectra of optically stimulated electron emission from irradiated dielectrics
复制标题
辐射电介质光激电子发射非选择性光谱的分析方法
DOI:
10.1002/pssa.200420054
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发表时间:
2005
期刊:
影响因子:
--
通讯作者:
V. Kortov
中科院分区:
文献类型:
--
作者:
A. Zatsepin;D. Biryukov;V. Kortov
A method has been proposed and substantiated for processing of nonselective optically stimulated electron emission (OSEE) spectra of irradiated crystalline and amorphous dielectrics. This method allows the separation of the emission contribution of discrete centers taking into account effects of radiation‐induced electrization of materials and the unsteady state of the electron emission. Separation of OSEE selective bands facilitates the establishment of the origin of discrete emission‐active centers and makes it possible to estimate the concentration and parameters of radiation defects localized in surface layers. The quantum yields of OSEE and ionization barriers of optically excited defects are calculated using kinetic and corrected isochronal temperature dependences of the emission current. Some capabilities of the method have been demonstrated by an example of glassy SiO2 and crystalline Be2SiO4. Oxygen‐deficient centers (ODCs), bulk and surface E′‐centers, and also non‐bridging oxygen hole centers (NBOHCs) have been recorded. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)