Surface characteristics for the Ti-Al-N coatings deposited by high power impulse magnetron sputtering technique at the different bias voltages
Surface characteristics for the Ti-Al-N coatings deposited by high power impulse magnetron sputtering technique at the different bias voltages
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DOI：
10.1016/j.jallcom.2016.07.013
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发表时间：
2016-12-15
影响因子：
6.2
通讯作者：
Mahboubi, F.
中科院分区：
文献类型：
--
作者：
Elmkhah, H.;Zhang, T. F.;Mahboubi, F.
高功率脉冲磁控溅射（HIPIMS）是一种新型的物理气相沉积（PVD）技术，已广泛应用于存款硬质薄膜。采用HIPIMS技术在-50 ~-200 V偏压下制备了TiAlN涂层，研究了偏压对TiAlN涂层显微结构、力学性能和摩擦学性能的影响。结果表明，由于选择性再溅射，TiAlN涂层中的Al含量降低。择优取向从（111）改变到（200），并且随着偏置电压的增加，峰移向较低的2 θ值。在偏压为-150 V和-100 V时，获得了力学性能和摩擦学性能最好的涂层。讨论了涂层织构、表面粗糙度和残余应力对涂层性能的影响。(C)© 2016 Elsevier B. V.版权所有。
High power impulse magnetron sputtering (HIPIMS) is the new PVD technique that has been widely used to deposit hard coatings. In this work, titanium-aluminum nitride (TiAlN) coatings were synthesized through using the HIPIMS technique with various bias voltages from -50 to -200 V. The influence of bias voltage on the microstructure, mechanical, and tribological properties of the TiAlN coatings were investigated. The results indicate that the Al content in TiAlN coatings decreased due to the selective resputtering. The preferred orientation altered from (111) to (200) and the peak shifted to lower 2 theta values which occurred as the bias voltage increased. The coatings with the best mechanical and tribological properties were obtained at the bias voltage of -150 and -100 V respectively. The influence of coating texture, surface roughness, and residual stress on the properties of the coatings was discussed. (C) 2016 Elsevier B.V. All rights reserved.