In situ ellipsometric diagnostics for controlled growth of metal oxides with surface chemical reactions
In situ ellipsometric diagnostics for controlled growth of metal oxides with surface chemical reactions
复制标题
原位椭圆测量诊断通过表面化学反应控制金属氧化物的生长
DOI：
10.1016/0169-4332(94)90262-3
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发表时间：
1994
期刊：
影响因子：
--
通讯作者：
K. Toyoda
中科院分区：
文献类型：
--
作者：
H. Kumagai;K. Toyoda
利用椭圆偏振光谱仪成功地对氧化铝等金属氧化物表面化学反应的可控生长进行了原位诊断。结果发现，在室温下的氧化铝膜的自限制生长清楚地观察到与交替计量的二元蒸汽的三甲基铝和过氧化氢。
In situ diagnostics for controlled growth of metal oxides such as aluminum oxide with surface chemical reactions was successfully conducted with a spectroscopic ellipsometer. It was found that the self-limiting growth of aluminum oxide films at room temperature was clearly observed with alternate dosing of binary vapors of trimethylaluminum and hydrogen peroxide.