Analysis of optical interferometric displacement detection in nanoelectromechanical systems
Analysis of optical interferometric displacement detection in nanoelectromechanical systems
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DOI：
10.1063/1.2148630
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发表时间：
2005-12-15
影响因子：
3.2
通讯作者：
Ekinci, KL
中科院分区：
文献类型：
--
作者：
Karabacak, D;Kouh, T;Ekinci, KL
光学干涉测量法已发现最近用于纳米机电系统（NEMS）的纳米尺度位移的检测。在NEMS的缩小长度尺度下，这些测量受到光衍射的强烈影响。在这里，我们提出了一个严格的数值模型的光学干涉位移检测NEMS。我们的模型结合了有限元方法与傅立叶光学，以确定电磁场在近场区域的NEMS和传播这个领域的检测器在远场。基于此模型的噪声分析，使我们能够阐明的位移灵敏度限制的光学干涉作为一个功能的设备尺寸以及重要的光学参数。我们的结果可能会为下一代改进的光学NEMS的设计提供好处。(c)2005年美国物理学会。
Optical interferometry has found recent use in the detection of nanometer scale displacements of nanoelectromechanical systems (NEMS). At the reduced length scale of NEMS, these measurements are strongly affected by the diffraction of light. Here, we present a rigorous numerical model of optical interferometric displacement detection in NEMS. Our model combines finite element methods with Fourier optics to determine the electromagnetic field in the near-field region of the NEMS and to propagate this field to a detector in the far field. The noise analysis based upon this model allows us to elucidate the displacement sensitivity limits of optical interferometry as a function of device dimensions as well as important optical parameters. Our results may provide benefits for the design of next generation, improved optical NEMS. (c) 2005 American Institute of Physics.