Image sensing with maximum sensitivity using industrial CMOS technology
Image sensing with maximum sensitivity using industrial CMOS technology
复制标题
使用工业 CMOS 技术实现最高灵敏度的图像传感
DOI:
10.1117/12.281222
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发表时间:
1997
影响因子:
3.5
通讯作者:
P. Seitz
中科院分区:
文献类型:
--
作者:
P. Seitz
Today's semiconductor industry is based on silicon as a semiconductor with excellent mechanical, chemical and electrical properties. Additionally, silicon is very effective in converting photons in the wavelength range of 0.1 - 1150 nm into charge carrier pairs. While this photoconversion process occurs essentially noise-free, the electronic detection of the collected photocharge is effectively responsible for the photodetection noise. The limiting physical effect is Johnson (resistor) noise in the channel of the first detection transistor, which depends on the input capacitance, the temperature and the detection bandwidth. This relationship can be exploited in several ways for the realization of image sensors in CCD and CMOS technology that exhibit sub-electron detection noise, reaching the ultimate physical limit of single-photon detection. Additionally, a physical effect can be employed for the amplification of charge signals before the actual electronic detection process: avalanche multiplication. Many of the described low-noise image sensors can be implemented in standard CCD or CMOS fabrication processes, opening up exciting prospects for affordable optical microsystems performing at the physical photodetection limits.