Direct Immersion Annealing of Thin Block Copolymer Films
Direct Immersion Annealing of Thin Block Copolymer Films
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DOI：
10.1021/acsami.5b06259
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发表时间：
2015-10-07
影响因子：
9.5
通讯作者：
Karim, Alamgir
中科院分区：
文献类型：
--
作者：
Modi, Arvind;Bhaway, Sarang M.;Karim, Alamgir
我们证明了薄嵌段共聚物(BC？)薄膜通过直接浸泡退火(DIA)以加速率获得稳定的形貌。BCP薄膜浸泡在精心挑选的优质溶剂和边缘溶剂的混合物中，这些溶剂可以增强聚合物的流动性，同时抑制薄膜的溶解。DIA与辊对辊组件制造兼容，与传统的热退火法和分批处理溶剂-蒸汽退火法相比具有明显的优势。对于弱相互作用的聚苯乙烯聚甲基丙烯酸甲酯(PS-PMMA)体系，我们在DIA中确定了三种依赖于溶剂组成的BCP薄膜有序区：快速短程有序区、最佳长程有序区和膜不稳定区。在“最佳长程有序”工艺下随温度变化的动力学研究表明，与常规温度下的烘箱退火相比，BCP晶粒生长的激活能显著降低。DIA的一个吸引人的特征是它对其他BCP(例如PS-P2VP)和PS-PMMA体系表现出球状、层状和柱状有序化的稳健性。
We demonstrate ordering of thin block copolymer (BC?) films via direct immersion annealing (DIA) at enhanced rate leading to stable morphologies. The BCP films are immersed in carefully selected mixtures of good and marginal solvents that can impart enhanced polymer mobility, while inhibiting film dissolution. DIA is compatible with roll-to-roll assembly manufacturing and has distinct advantages over conventional thermal annealing and batch processing solvent-vapor annealing methods. We identify three solvent composition-dependent BCP film ordering regimes in DIA for the weakly interacting polystyrene poly(methyl methacrylate) (PS-PMMA) system: rapid short-range order, optimal long-range order, and a film instability regime. Kinetic studies in the "optimal long-range order" processing regime as a function of temperature indicate a significant reduction of activation energy for BCP grain growth compared to oven annealing at conventional temperatures. An attractive feature of DIA is its robustness to ordering other BCP (e.g. PS-P2VP) and PS-PMMA systems exhibiting spherical, lamellar and cylindrical ordering.