Industrial perspective on focused electron beam-induced processes
Industrial perspective on focused electron beam-induced processes
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DOI：
10.1007/s00339-014-8601-2
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发表时间：
2014-12-01
影响因子：
2.7
通讯作者：
Edinger, Klaus
中科院分区：
文献类型：
--
作者：
Bret, Tristan;Hofmann, Thorsten;Edinger, Klaus
在简要概述了气体辅助聚焦电子束诱导加工技术（主要是沉积和蚀刻）的历史发展之后，本文讨论了该技术在光刻掩模修复中的应用。针对不同类型的掩模、不同类型的缺陷以及不同的节点代显示结果的注释列表。本文的范围是双重的：总结“摩尔定律”驱动的快节奏、高度特定的工业环境中的最新技术，并向学术研究人员反馈一些技术相关的方向以供进一步研究。
After a short overview of the historical developments of the technique of gas-assisted focused electron beam-induced processing (mostly deposition and etching), this paper deals with the applications of this technology to photolithographic mask repair. A commented list of results is shown on different mask types, for different types of defects, and at different node generations. The scope of this article is double: summarize the state of the art in a fast-paced highly specific industrial environment driven by "Moore's law" and feedback to academic researchers some technologically relevant directions for further investigations.