In situ growth of YBa2Cu3Ox thin films by reactive cosputtering
In situ growth of YBa2Cu3Ox thin films by reactive cosputtering
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反应共溅射原位生长 YBa2Cu3Ox 薄膜
DOI：
10.1116/1.578070
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发表时间：
1992
期刊：
影响因子：
--
通讯作者：
A. Kapitulnik
中科院分区：
文献类型：
--
作者：
M. Hahn;T. L. Hylton;K. Char;M. Beasley;A. Kapitulnik
We have synthesized superconducting YBa2Cu3Ox thin films in situ using magnetron cosputtering with three metallic targets (Y, Ba, Cu). We present details of the sputtering chamber, as well as the growth conditions necessary to obtain superconducting films. We discuss the effects of oxygen and ozone partial pressure, differential pumping, O2–Ar plasma deposition and Ba–Cu alloy targets. We elaborate on our ozone condensing and delivery system. Finally, we describe the difficulties encountered with the deposition system and provide details of possible improvements.
