Fabrication and Characterization of Diffraction Gratings Using Photosensitive Al2O3 Gel Films
Fabrication and Characterization of Diffraction Gratings Using Photosensitive Al2O3 Gel Films
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DOI:
10.1143/jjap.37.1842
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发表时间:
1998-04
影响因子:
1.5
通讯作者:
Gaoyang Zhao;N. Tohge;J. Nishii
中科院分区:
文献类型:
--
作者:
Gaoyang Zhao;N. Tohge;J. Nishii
A new process for the fabrication of diffraction gratings has been proposed using photosensitive Al2O3 gel films in combination with a phase mask. Photosensitive Al2O3 gel films were derived from Al(O-sec-Bu)3 chemically modified with benzoylacetone. These gel films exhibited an optical absorption band in the UV-range, which is associated with the π–π* transition of chelate rings of the β-diketonate ligand. The irradiation of these gel films with XeF and KrF excimer lasers decreased their solubility in acetone containing 1.2 vol%HNO3, simultaneously with the dissociation of the remaining chelate rings. The above findings were applied to the fabrication of Al2O3 film diffraction gratings on Si and silica substrates; the gel films were irradiated with the excimer lasers through a phase mask, leached, and then heat-treated. The diffraction efficiency of the fabricated gratings was evaluated in reflection (Si sub.) and transmission (silica sub.) modes with respect to the preparation conditions.