Lithography Based on Molecular Glasses
Lithography Based on Molecular Glasses
复制标题
DOI：
10.2494/photopolymer.18.431
复制
发表时间：
2005
影响因子：
0.8
通讯作者：
K. Tsuchiya;S. Chang;N. Felix;M. Ueda;C. Ober
中科院分区：
文献类型：
--
作者：
K. Tsuchiya;S. Chang;N. Felix;M. Ueda;C. Ober
合成了几种新型的分子玻璃作为下一代光刻胶材料。这些化合物被保护基团的化学放大系统，并证明具有高的玻璃化转变温度（Tg）以及无定形性能。正性光刻胶系统与六（叔丁氧基羰基氧基苯基）苯，使用电子束光刻和200 nm的图案尺寸被证明。
Several novel classes of molecular glasses were synthesized as photoresist materials for next generation lithography. These compounds were protected by protecting groups for chemically amplified systems and proved to possess high glass transition temperature (Tg) as well as amorphous properties. A positive-tone photoresist system with hexa(t-butoxy- carbonyloxyphenyl)benzene was demonstrated using E-beam lithography and 200 nm pattern size was obtained.