Crystallographic characterization of epitaxial Pb(Zr,Ti)O3 films with different Zr/Ti ratio grown by radio-frequency-magnetron sputtering
Crystallographic characterization of epitaxial Pb(Zr,Ti)O3 films with different Zr/Ti ratio grown by radio-frequency-magnetron sputtering
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DOI：
10.1063/1.1558951
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发表时间：
2003-03
影响因子：
3.2
通讯作者：
I. Kanno;H. Kotera;K. Wasa;T. Matsunaga;T. Kamada;R. Takayama
中科院分区：
文献类型：
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作者：
I. Kanno;H. Kotera;K. Wasa;T. Matsunaga;T. Kamada;R. Takayama
研究了外延Pb（Zr，Ti）O3（PZT）薄膜的晶体结构与Zr/Ti比和晶体取向的关系。采用射频溅射法分别在（100）和（111）SrTiO 3衬底上外延生长了（001）和（111）取向的PZT薄膜。四圆X射线衍射测量表明，PZT薄膜中Zr/Ti组分的晶体学依赖性与体PZT有很大不同。特别是，即使在Zr/Ti为70/30的组分中，（001）取向的PZT薄膜也显示出四方晶系结构，其中PZT陶瓷体为菱面体相。此外，虽然Zr/Ti比为53/47和70/30的（001）取向的PZT薄膜呈四方结构，但相同Zr/Ti比的（111）取向的PZT薄膜被鉴定为三方结构。两种取向的PZT薄膜的晶胞体积都有所增加，这表明高能溅射粒子撞击导致薄膜中多余的Pb原子导致了薄膜的反常结晶。
Crystallographic structure of as-grown epitaxial Pb(Zr,Ti)O3 (PZT) films was investigated with regard to the Zr/Ti ratio and crystalline orientation. PZT films with (001) and (111) orientation were epitaxially grown on (100) and (111)SrTiO3 substrates respectively using radio-frequency (rf) sputtering. Four circle x-ray diffraction measurements revealed that the crystallographic dependence on Zr/Ti composition in PZT films was much different from bulk PZT. In particular, (001)-oriented PZT films showed tetragonal structure even in the Zr/Ti composition of 70/30 where the bulk PZT ceramics are rhombohedral phase. In addition, although (001)-oriented PZT films with Zr/Ti ratio of 53/47 and 70/30 showed tetragonal structure, (111)-oriented PZT films with the same Zr/Ti ratio were identified as the rhombohedral structure. The cell volume of the PZT films with both orientations increased, suggesting the excess Pb atoms in the films due to the impinging energetic sputtered particles induces the anomalous crysta...