Hybrid plasma system for magnetron deposition of coatings with ion assistance
Hybrid plasma system for magnetron deposition of coatings with ion assistance
复制标题
用于离子辅助磁控管沉积涂层的混合等离子体系统
DOI：
10.1088/1742-6596/669/1/012033
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发表时间：
2016
期刊：
影响因子：
--
通讯作者：
V. Sologub
中科院分区：
文献类型：
--
作者：
K. Vavilin;E. Kralkina;P. Nekludova;A. Petrov;A. Nikonov;V. Pavlov;A. Airapetov;V. Odinokov;G. Pavlov;V. Sologub
给出了磁控放电和高频感应放电相结合的外加磁场等离子体混合系统的研究结果。磁控放电提供靶材料的原子和离子的产生，而用于离子辅助的加速离子流由射频感应放电提供。利用外加磁场来优化放电的功率输入，增加衬底区域的离子电流密度，增强均匀的等离子体面积。磁控管和射频感应放电的联合工作使溅射材料谱线辐射的离子电流密度和强度大幅度增加(不等于两个混合系统通道单独工作时的参数之和)。混合等离子体系统的最佳运行模式是在0.7PaAr气压下提供直径至少150 mm的均匀离子流密度。在衬底位置区域的磁场的最佳值在2-8MTL范围内，而在RF输入功率单元的区域内的磁场在0.5-25MTL范围内。
The results of the study of the plasma hybrid system based on the combined magnetron discharge and high-frequency inductive discharge located in the external magnetic field is presented. Magnetron discharge provides the generation of atoms and ions of the target materials while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge. An external magnetic field is used to optimize the power input to the discharge, to increase the ion current density in the realm of substrate and to enhance the area of uniform plasma. The joint operation of magnetron and RF inductive discharge leads to a substantial increase (not equal to the sum of the parameters obtained under separate operation of two hybrid system channels) of the ion current density and intensity of sputtered material spectral lines radiation. Optimal mode of the hybrid plasma system operation provides uniform ion current density on the diameter of at least 150mm at 0.7PA argon pressure. The optimal values of the magnetic fields in the region of the substrate location lie in the range 2-8 mTl, while in the region of the RF input power unit lie in the range 0.5-25 mTl.