Effect of Self-Assembled Monolayer Modification on Indium–Tin Oxide Surface for Surface-Initiated Vapor Deposition Polymerization of Carbazole Thin Films
Effect of Self-Assembled Monolayer Modification on Indium–Tin Oxide Surface for Surface-Initiated Vapor Deposition Polymerization of Carbazole Thin Films
复制标题
氧化铟锡表面自组装单分子层修饰对咔唑薄膜表面引发气相沉积聚合的影响
DOI：
10.1143/jjap.49.04dk21
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发表时间：
2010
影响因子：
1.5
通讯作者：
H. Usui
中科院分区：
文献类型：
--
作者：
Y. Umemoto;Seong;R. Advíncula;Kuniaki Tanaka;H. Usui
为了控制无机电极和有机层之间的界面，采用表面引发气相沉积聚合方法制备了与氧化铟锡（ITO）表面化学键合的咔唑聚合物薄膜。在ITO表面制备了以偶氮引发剂为末端基团的自组装单分子层（SAM），并在紫外线（UV）照射下使咔唑丙烯酸酯单体在其上蒸发。比较了有/无UV照射以及有/无SAM时所制备薄膜的表面形态特征。发现无论使用何种基底，UV照射都会导致咔唑单体聚合。另一方面，表面形态特征在很大程度上取决于SAM的存在。只有当单体在UV照射下于SAM修饰的表面上蒸发时，才能获得均匀且光滑的聚合物薄膜。对经UV - 臭氧处理的ITO表面上薄膜生长特征的比较表明，均匀薄膜的形成不是通过表面能的改变，而是通过与基底表面化学键合的聚合物的生长实现的。
With the aim of controlling the interface between an inorganic electrode and an organic layer, a surface-initiated vapor deposition polymerization method was employed to prepare carbazole polymer thin films that are chemically bound to an indium–tin oxide (ITO) surface. A self-assembled monolayer (SAM) that has an azo initiator as a terminal group was prepared on an ITO surface, on which carbazole acrylate monomers were evaporated under ultraviolet (UV) irradiation. The surface morphological characteristics of the films prepared with/without UV irradiation and with/without the SAM were compared. It was found that the UV irradiation leads to the polymerization of carbazole monomers irrespective of the type of substrate used. On the other hand, the surface morphological characteristics were largely dependent on the existence of the SAM. Uniform and smooth polymer thin films were obtained only when the monomers were evaporated on the SAM-modified surface under UV irradiation. A comparison of film growth characteristics on a UV–ozone-treated ITO surface suggested that the formation of uniform films was made possible not by the modification of surface energy but by the growth of the polymers chemically bound to the substrate surface.
表面引发沉积聚合界面控制及其在有机发光器件中的应用
DOI：
--
发表时间：
2008
期刊：
Japanese Journal of Applied Physics 47
影响因子：
--
作者：
T.Nakato;Y.Yamashita;K.Kuroda;Hiroshi Koshikawa;Masanori Fukushima;T.Nakato;Akira Kawakami
通讯作者：
Akira Kawakami