Nanopatterning of vapor-deposited aminosilane film using EB lithography for ferritin protein adsorption
Nanopatterning of vapor-deposited aminosilane film using EB lithography for ferritin protein adsorption
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DOI：
10.2494/photopolymer.18.495
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发表时间：
2005-01-01
影响因子：
0.8
通讯作者：
Yamashita, I
中科院分区：
文献类型：
--
作者：
Kumagai, S;Yoshii, S;Yamashita, I
高密度铁蛋白纳米图案-蛋白质和核心复合物-硅基板上实现了使用氨基修饰的纳米图案。这些图案通过EB光刻和3-氨丙基三乙氧基硅烷（APTES）的气相沉积的组合制成。一个适当的缓冲溶液，相对于pH值和德拜长度，抑制铁蛋白吸附在二氧化硅底层，而铁蛋白吸附在纳米尺寸的APTES层上的高密度。我们获得了50 nm的图案化的铁蛋白，通过使用具有1000 nm德拜长度（pH 7.0）的溶液;与此解决方案，有吸引力的铁蛋白-APTES相互作用似乎是强大到足以克服排斥铁蛋白-二氧化硅相互作用。
High-density ferritin nanopatterning - the protein and core complex - on a silicon substrate was achieved using nanometric patterns of amino-group modification. These patterns were made through a combination of EB lithography and vapor-phase deposition of 3-aminopropyltriethoxysilane (APTES). An appropriate buffer solution, with respect to pH and Debye length, suppressed ferritin adsorption on the SiO2 underlayer while ferritins were adsorbed with high density on a nanometer-size APTES layer. We obtained 50-nm patterned ferritins by using a solution with a 1000-nm Debye length (pH 7.0); with this solution, the attractive ferritin-APTES interaction seemed to be strong enough to overcome the repulsive ferritin-SiO2 interaction.