Growth and characterization of InGaN nanodots hybrid with InGaN/GaN quantum wells
Growth and characterization of InGaN nanodots hybrid with InGaN/GaN quantum wells
复制标题
具有 InGaN/GaN 量子阱的 InGaN 纳米点混合体的生长和表征
DOI:
10.1007/s00339-012-7112-2
复制
发表时间:
2012
期刊:
影响因子:
--
通讯作者:
Y. Zheng
中科院分区:
文献类型:
--
作者:
G. Yang;P. Chen;Z. G. Yu;B. Liu;Z. Xie;X. Xiu;Z. L. Wu;F. Xu;Z. Xu;X. Hua;P. Han;Y. Shi;R. Zhang;Y. Zheng
Uniform InGaN nanodots were successfully grown on SiO2pretreated GaN surface. It was found that the InGaN nanodots were 20 nm in diameter and 5 nm in height, approximately. After the growth of two periods of InGaN/GaN quantum wells on the surface of InGaN nanodots, nanodot structure still formed in the InGaN well layer caused by the enhanced phase separation phenomenon. Dual-color emissions with different behavior were observed from photoluminescence (PL) spectrum of InGaN nanodots hybrid with InGaN/GaN quantum wells. A significant blueshift and a linewidth broadening were measured for the low-energy peak as the increase of PL excitation power, while a slight blueshift and a linewidth narrowing occurred for the high-energy peak. Accordingly, these two peaks were assigned to be from the In-rich nanodots and quantized state transition from the InGaN/GaN quantum wells with indium content, respectively.