Electronic and chemical analysis of fluoride interface structures at subnanometer spatial resolution
Electronic and chemical analysis of fluoride interface structures at subnanometer spatial resolution
复制标题
亚纳米空间分辨率氟化物界面结构的电子和化学分析
DOI：
10.1116/1.583324
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发表时间：
1986
影响因子：
1.4
通讯作者：
M. Isaacson
中科院分区：
文献类型：
--
作者：
M. Scheinfein;M. Isaacson
使用100 keV的电子的直径小于0.5 nm的细聚焦束，我们已经能够分析的透射电子能量损失谱（EELS）的变化，在亚纳米空间分辨率的电子探针移动跨越各种氟化物界面结构。此外，使用剂量分辨EELS的方法，我们已经能够确定CaF2束曝光的辐射化学。
Using a finely focused beam of 100 keV electrons of less than 0.5 nm diam we have been able to analyze changes in the transmission electron energy loss spectra (EELS) at subnanometer spatial resolution as the electron probe is moved across various fluoride interface structures. In addition, using the method of dose resolved EELS we have been able to determine the radiation chemistry of CaF2 beam exposure.