Structure and properties of biomedical TiO2 films synthesized by dual plasma deposition
Structure and properties of biomedical TiO2 films synthesized by dual plasma deposition
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DOI：
10.1016/s0257-8972(02)00092-0
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发表时间：
2002-07
影响因子：
5.4
通讯作者：
Y. Leng;N. Huang;P. Yang;Jun-ying Chen;Hong Sun;J. Wang;G. Wan;X. Tian;R. Fu;L. Wang;P. Chu
中科院分区：
文献类型：
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作者：
Y. Leng;N. Huang;P. Yang;Jun-ying Chen;Hong Sun;J. Wang;G. Wan;X. Tian;R. Fu;L. Wang;P. Chu
钛金属及钛合金具有较高的耐腐蚀性和良好的生物相容性，是目前生物医用设备中应用最广泛的材料之一。研究表明，表面天然氧化物的物理化学性质和介电性质对生物相容性起着至关重要的作用。越来越多的证据表明，钛可以在体内被广泛释放，并在一定条件下积聚在邻近组织中或运输到远处的器官。因此，有必要在钛表面制备更厚、更致密的二氧化钛薄膜，以提高其生物医学性能。在本文中，我们讨论了利用金属真空电弧和射频产生的双等离子体制作技术。所制备的薄膜由金红石晶体组成，尽管衬底不加热。随着氧分压的升高，(101)和(110)衍射峰的强度增大，而(002)衍射峰的强度减小。由于表面自由能和离子轰击的竞争，二氧化钛薄膜的择优取向从(002)向(110)转变。在低氧分压下，二氧化钛颗粒的生长主要受离子轰击的影响，而在较高的氧分压下，热力学因素对薄膜的生长有影响。当氧分压达到0.93×10−2Pa时，氧气流量的进一步增加不会改变薄膜的成分。薄膜完全氧化，只有TiO2相。薄膜的显微硬度随氧分压的增加而增加，在1.7×10−2Pa时达到最大值19 GPa.
Titanium metal and titanium alloys are among the most widely used materials in biomedical devices because of their relatively high corrosion resistance and good biocompatibility. It has been suggested that the physiochemical and dielectric properties of the surface native oxide play a crucial role in the biocompatibility. There is increasing evidence that titanium may be extensively released in vivo and, under certain conditions, accumulated in adjacent tissues or transported to distant organs. Therefore, it is necessary to synthesize thicker and denser TiO2films on titanium to enhance its biomedical properties. In this paper, we discuss our fabrication technique utilizing dual plasma generated by metal vacuum arc and radio frequency. The films fabricated consist of rutile crystal, although the substrates are not heated. As the oxygen partial pressure is raised, the intensity of the (101) and (110) diffraction peaks increases, and that of the (002) diffraction peak decreases. The preferred orientation of the TiO2film shifts from (002) to (110) as a result of the competition between the surface free energy and ion bombardment. At low oxygen pressure, the TiO2grain growth is mainly affected by ion bombardment, whereas thermodynamic factors affect the film growth at higher oxygen partial pressure. When the oxygen partial pressure reaches 0.93×10−2Pa, further increase in the oxygen flow rate does not change the film composition. The film is completely oxidized and only comprises the TiO2phase. The microhardness of the TiO2films increases with the oxygen partial pressure and reaches a maximum value of 19 GPa at 1.7×10−2Pa.