Fabrication and testing of planar chalcogenide waveguide integrated microfluidic sensor
Fabrication and testing of planar chalcogenide waveguide integrated microfluidic sensor
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DOI:
10.1364/oe.15.002307
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发表时间:
2007-03-05
期刊:
影响因子:
3.8
通讯作者:
Richardson, Kathleen
中科院分区:
文献类型:
--
作者:
Hu, Juejun;Tarasov, Vladimir;Richardson, Kathleen
We have fabricated and tested, to the best of our knowledge, the first microfluidic device monolithically integrated with planar chalcogenide glass waveguides on a silicon substrate. High-quality Ge23Sb7S70 glass films have been deposited onto oxide coated silicon wafers using thermal evaporation, and high-index-contrast channel waveguides have been defined using SF6 plasma etching. Microfluidic channel patterning in photocurable resin (SU8) and channel sealing by a polydimethylsiloxane (PDMS) cover completed the device fabrication. The chalcogenide waveguides yield a transmission loss of 2.3 dB/cm at 1550 nm. We show in this letter that using this device, N-methylaniline can be detected using its well-defined absorption fingerprint of the N-H bond near 1496 nm. Our measurements indicate linear response of the sensor to varying N-methylaniline concentrations. From our experiments, a sensitivity of this sensor down to a N-methylaniline concentration 0.7 vol. % is expected. Given the low-cost fabrication process used, and robust device configuration, our integration scheme provides a promising device platform for chemical sensing applications. (c) 2007 Optical Society of America.