Preparation and Characterization of Graphene Oxide
Preparation and Characterization of Graphene Oxide
复制标题
DOI：
10.1155/2014/276143
复制
发表时间：
2014-01-01
影响因子：
--
通讯作者：
Chang, Chang-Tang
中科院分区：
文献类型：
--
作者：
Song, Jianguo;Wang, Xinzhi;Chang, Chang-Tang
采用改进的Hummer法成功制备了具有二维结构的氧化石墨烯（GO）薄膜。氧化还原法是一种很有前途的大规模制备GO薄膜的方法。对GO膜的性能进行了全面的表征。TEM和DFM分析表明，本研究制备的GO片具有单层和双层层状结构，厚度约为2 ~ 3 nm。选择X射线衍射（XRD）来测量GO片的晶体结构。傅里叶变换红外光谱分析仪（FT-IR）被用来证明在GO膜中的含氧官能团的存在。紫外-可见分光光度计和热重分析仪的测试表明，GO片具有良好的光学响应和优异的热稳定性。用元素分析仪（EA）和X射线光电子能谱仪（XPS）对合成材料进行了成分分析。同时，对GO片的化学结构进行了描述。为石墨烯的进一步研究提供了讨论和参考。
Graphene oxide (GO) films with two-dimensional structure were successfully prepared via the modified Hummer method. It is proven that redox method is a promising way to synthesize GO films on a large scale. Comprehensive characterizations of the properties of GO films were conducted. TEM and DFM analyses showed that GO sheets prepared in this study had single and double lamellar layer structure and a thickness of 2 similar to 3 nm. X-ray diffraction (XRD) was selected to measure the crystal structure of GO sheet. Fourier-transform infrared spectra analyzer (FT-IR) was used to certify the presence of oxygen-containing functional groups in GO films. The tests of UV-VIS spectrometer and TGA analyzer indicated that GO sheet possessed excellent optical response and outstanding thermal stability. Elemental analyzer (EA) and X-ray photoelectron spectroscope (XPS) analyzed the components synthetic material. Simultaneously, chemical structure of GO sheet was described in this study. Discussion and references for further research on graphene are provided.