Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing
Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing
复制标题
DOI：
10.1007/s11090-017-9847-1
复制
发表时间：
2017-09
影响因子：
3.6
通讯作者：
M. Hossain;Y. Ohtsu;T. Tabaru
中科院分区：
文献类型：
--
作者：
M. Hossain;Y. Ohtsu;T. Tabaru
我们提出了一种用于材料加工和功能薄膜制备的旋转方形电容射频放电等离子体溅射源，该溅射源由八个尺寸为 30 mm × 5 mm × 3 mm 的钕棒磁体组成的磁体排列组成。为了评估其性能，研究了两种方形磁性装置：无铁屏蔽的情况 (a) 和有铁屏蔽的情况 (b)，尺寸为 5 mm × 3 mm × 1 mm。分析了磁场模拟，同时测量了等离子体放电特性和薄膜特性。情况 (b) 的薄膜厚度和电阻率分布比情况 (a) 中相应的分布更加均匀。对于情况 (b)，薄膜的最低电阻率为 4.33 × 10−8Ω m atr= 30 mm，与铜的体电阻率处于同一数量级。情况(a)和(b)的膜厚度分布的粗糙度分别为±24.4和±7.2%。使用原子力显微镜分析，观察到情况（b）的薄膜表面与情况（a）相比显示出改善的光滑表面、减小的针状晶粒尺寸和更低的表面粗糙度。对于情况 (a) 和情况 (b)，薄膜的表面粗糙度分别约为 3.73 和 2.49 nm。根据X射线衍射图案，发现情况(a)和(b)的膜织构、(111)峰与(200)峰的相对强度比[I(111)/I(200)]分别为13.76和4.08。
We proposed a gyratory square-shaped capacitive radio-frequency discharge plasma sputtering source for materials processing and functional film preparation, composed of magnet arrangements consisting of eight neodymium bar magnets of dimensions 30 mm × 5 mm × 3 mm. In order to evaluate its performance, two square-shaped magnetic arrangements were investigated: case (a) without iron shielding and case (b) with iron shielding of dimensions 5 mm × 3 mm × 1 mm. The magnetic field simulation is analyzed, while the plasma discharge characteristics and the film properties are measured. The film thickness and the resistivity profiles of case (b) are more uniform than their corresponding profiles in case (a). The lowest electrical resistivity of the film is 4.33 × 10−8Ω m atr= 30 mm for case (b), which is of the same order as the bulk resistivity of the copper. The roughnesses of the film thickness profile for cases (a) and (b) are ±24.4 and ±7.2%, respectively. Using atomic force microscopy analysis, the film surface for case (b) was observed to show an improved smooth surface with reduced needle-shaped grain size and a lower surface roughness than that of case (a). The surface roughness of the films is approximately 3.73 and 2.49 nm for case (a) and case (b), respectively. From the X-ray diffraction patterns, the film texture, the relative intensity ratios of the (111) peak to the (200) [I(111)/ I(200)] were found to be 13.76 and 4.08 for the cases (a) and (b), respectively.