Electron energy analysis in Scanning Field Emission Microscopy using a Bessel box energy analyzer

Electron energy analysis in Scanning Field Emission Microscopy using a Bessel box energy analyzer
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使用贝塞尔盒能量分析仪在扫描场发射显微镜中进行电子能量分析

DOI:
10.1109/ivnc52431.2021.9600768
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发表时间:
2021
期刊:
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影响因子:
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通讯作者:
Bodik M
Bodik M
中科院分区:
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文献类型:
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作者:
Bodik M

文献摘要

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在这项研究中,我们使用扫描场发射显微镜(SFEM)与称为贝塞尔盒的微型电子能量分析仪相结合来测量样品发射的电子能谱。先前使用 SFEM 的研究表明,所研究材料的功函数 (ψ) 在信号强度的形成中发挥着重要作用。因此,为了更详细地了解 Φ 的作用,我们研究了 W(110) 样品(Φ = 5.25 eV)和沉积在 W(110) 上的 Cs 样品(Φ ≈ 1.7 eV)。 STM 图像显示,铯覆盖的表面具有斑点外观,表明存在小铯岛。获得的电子能量损失谱(这是首次在 SFEM 中使用贝塞尔盒)显示弹性峰区域的不同结构。包括量子力学“弹跳”在内的蒙特卡罗(MC)模拟已经进行。结果与从针尖-样品连接处逃逸的电子的 MC 模拟一致。
In this study, we use Scanning Field Emission Microscopy (SFEM) combined with a miniature electron energy analyzer known as a Bessel box to measure electron energy spectra emitted from a sample. Previous studies using SFEM have revealed that the work function (ϕ) of the material under study has a significant role to play in the formation of the signal intensity. Hence, in order to understand the role of ϕ in greater detail, a sample of W(110) (ϕ = 5.25 eV) and a sample of Cs deposited on W(110) (ϕ ≈ 1.7 eV) were investigated. STM images show that the Cs covered surface has a speckled appearance indicating small Cs islands. The electron energy loss spectra obtained (which are the first using the Bessel box in SFEM) show differing structure in the elastic peak region. Monte Carlo (MC) simulations including quantum mechanical "bouncing" have been carried out. The results are consistent with MC simulations of the electrons escaping from the tip-sample junction.